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This review article discusses and compares various techniques for fabricating metal nanowires. We begin by defining what we mean by a nanowire, and why such nanostructures are of scientific and technological interest. We then present different fabrication methodologies, describing in some detail the advantages of each. "Top-down" techniques discussed include: electron beam lithography; scanned probe lithography; step-edge and molecular beam epitaxy templating; and nanotube templating. "Bottom-up" methodologies covered include: electrodeposition into etched porous media; direct chemical synthesis; step-edge decoration; and strain-mediated self-assembly. We conclude by summarizing our observations and briefly discuss the future of metal nanowire fabrication.
Comment: 5 pages, 5 figures. Accepted to PRB as Brief Report
Comment: 5 pages, four figures. Submitted to Nano Letters
Comment: 22 pages, 7 figures, accepted to J. Appl. Phys
Comment: 7 pages, 7 figures, sub. to J. Appl. Phys
Comment: 7 pages, 8 figures. To appear in July 2005 Proc. of the IEEE, Special Issue on Flexible Electronics
Comment: 15 pages, 8 figures. To appear in Oct. 2004 issue of Nanotechnology, proceedings of International Conference on Nanoscale Devices and Systems Integration
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